The Laurell WS-650MZ-23NPPB spin coater (SN:16771):
is compact and packed with advanced features. This 650-series coater system will accommodate up to ø150mm wafers and 5" × 5" (127mm × 127mm) substrates, and features a maximum rotational speed of 12,000 RPM (based on a ø100mm silicon wafer).
Applications:
The WS-650 series is typically employed for Solvent, Base or Acid-based processing: Coating, Etching, Developing, Rinsing-Drying, thin film and Cleaning. While all of these process are supported, Laurell recommends single-use only, due to known material conflicts. For example, Photo resist and Developer (cross-contamination), and SC-1 & SC-2 (HCl + NH4OH), creating NH4Cl, a hazardous inhalation risk.
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